AMAT / Applied Materials | Centura HTF | WCVD Cluster 2 Chambers | 319567 | 8 | 2000 | Dresden | |
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Hitachi | CG4000 | | 3106-01 | 12 | | Singapore | |
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Hitachi | CG4000 | | 3106-02 | 12 | | Singapore | |
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Hitachi | CG4000 | | 3113-03 | 12 | | Singapore | |
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SEZ | RST-101 | 1 Chamber | 0247 | 6 | 1997 | Korea | |
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SEZ | RST 201 | 1 Chamber | 0196 | 6 | 1997 | Taiwan | |
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SEZ | 203 | 1 Chamber | 1157 | 4, 5, 6, 8 | 1999 | Austria | |
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SEZ | 223 | 2 Chamber | 919 | 4, 5, 6, 8 | 2004 | Austria | |
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SEZ | 304 | 1 Chamber | 438 | 8, 12 | | Austria | |
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SEZ | 305 | 1 Chamber | 1032 | 8, 12 | 2006 | Austria | |
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SEZ | 323 | 2 Chambers | 605 | 8, 12 | 2002 | Austria | |
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SEZ | 323 | 2 Chambers | 623 | 8, 12 | | Austria | |
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SEZ | 323 | 2 Chambers | 00988 | 8, 12 | 2005 | Austria | |
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SEZ | 323 | 2 Chambers | 01066 | 8, 12 | 2006 | Austria | |
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SEZ | 323 | 2 Chambers | 0703 | 8, 12 | 2003 | Austria | |
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SEZ | 323 | 2 Chambers | 00938 | 8, 12 | 2005 | Taiwan | |
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SEZ | DV34 | 4 Chambers | 875 | 8, 12 | | Austria | |
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SEZ | DV34 | 4 Chambers | 1225 | 8, 12 | 2007 | Austria | |
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SEZ | DV34 | 4 Chambers | 1242 | 8, 12 | 2007 | Austria | |
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SEZ | ES34 | 4 Chambers | 1125 | 8, 12 | 2008 | Austria | |
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SEZ | ES34 | 4 Chambers | 1160 | 8, 12 | 2008 | Korea | |
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TEL | Expedius + | | W083557 | 12 | 2007 | Taiwan | |
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TEL | Expedius + | | W072491 | 12 | 2007 | Taiwan | |
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ASM | A412 | Dual ATM Oxide (Dry Oxide) | 30360 | 12 | 2007 | Taiwan | |
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ASM | A412 | Dual Reactor Poly | 30412 | 12 | 2004 | Taiwan | |
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ASM | A412 | Dual Reactor Poly | 30350 | 12 | | Taiwan | |
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ASM | A412 | Nitride Dual Reactor | 30127 | 12 | | Taiwan | |
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ASM | A412 | Vertical LPCVD Furnace (Poly) | 30294 | 12 | | Taiwan | |
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ASM | A412 | Vertical LPCVD Furnace (Poly) | 30312 | 12 | | Taiwan | |
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ASM | A412 | Vertical LPCVD Furnace (Poly) | 30265 | 12 | | Taiwan | |
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ASM | A412 | Vertical LPCVD Furnace (Poly) | 30297 | 12 | | Taiwan | |
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ASM | A412 | Vertical LPCVD Furnace (Poly) | 30295 | 12 | 2006 | Taiwan | |
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ASM | A412 | Vertical LPCVD Furnace (Poly) | 30271 | 12 | 2006 | Taiwan | |
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ASM | A412 | Veritcal LPCVD Furnace (NITR) | 30270/10 | 12 | 2006 | Taiwan | |
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ASM | Eagle-12 Rapidfire | PECVD (Chemical Vapor Deposition) | 1289 | 12 | | Taiwan | |
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ASM | A400 Furnace Single Reactor | Nitride, x01 Reactor | 2E0127/10 | 8 | | Dresden | |
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Suss Microtec | Falcon | Coat / Develop | AK243267 | 4, 5, 6, 8 | 2002 | Austria | |
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Suss Microtec | ACS200/Falcon | 3x Coater | AK20032 | 4, 5, 6, 8 | 2000 | Austria | |
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Suss Microtec | ACS200/Falcon | 4x Developer | AK20033 | 4, 5, 6, 8 | 2000 | Austria | |
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Suss Microtec | ACS300 | 4x Developer | 256426 | 8, 12 | 2008 | Austria | |
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Suss Microtec | Gamma | | 300084 | | 2010 | Singapore | |
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Suss Microtec | Gamma | | 255653 | | 2010 | Singapore | |
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Suss Microtec | Gamma 80 | Coater-CSM | AK-40126 | | | Taiwan | |
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Suss Microtec | Gamma 80 | Coater-CSM | | | | Taiwan | |
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Esec | 2008XP | Die Bonder | 206010 | 6 | 2002 | Philippines | |
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Esec | 2008XP | Die Bonder | 206632 | 6 | 2004 | Philippines | |
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Semitool | Raider | ECD 310 | T239383 | 12 | 2009 | Philippines | |
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Semitool | Raider | ECD210 | T239451 | 6 | 2010 | Philippines | |
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Semitool | Raider Mini Quatro | | T239257 | | | Philippines | |
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Semitool | STORM | 300 | T239537 | 12 | 2010 | Philippines | |
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Semitool | STORM 3 | | H174554 | 6 | | Philippines | |
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Semitool | STORM 3 | | H92738 | 4 | | Philippines | |
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Semitool | SST 201 (Cintillio) | 1 Chamber | 102893 | 8 | 2011 | China | |
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Semitool | SST 742 | Wet | F59353 | 6 | | China | |
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Semitool | SST 742 | Wet | F106911 | 8 | | Japan | |
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Semitool | SSTC421280M | Spray solvent tool (Phototresist) | F110681 | 8 | | Dresden | |
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DNS | SU-3100 | 4 Chambers | 530L001006A | 12 | 2008 | Japan | |
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DNS | FC821L-L22, WCSS30 | | 630200023A | 8 | | Dresden | |
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DNS | WS-620 C | Wafercleaner Card; 3 Baths | 58520-1074 | 6 | | Dresden | |
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DNS | FS-820 L | Wafercleaner, 3 Baths | 58630-0184 | 6 | | Dresden | |
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DNS | FS-820 L | Wafercleaner, 3 Baths | 58630-0185 | 6 | | Dresden | |
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Hitachi | S-8840 | CD-SEM | | 4,5,6,8 | | USA | |
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Hitachi | S9200 | CD-SEM | | 5,6,8 | | Dresden | |
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Hitachi | S9220 | CD-SEM | 9744-06 | 8 | | Singapore | |
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Hitachi | S-9260A | CD-SEM | 1140-05 | 8 | 2011 | Dresden | |
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Hitachi | S-9260A | CD-SEM | 1126-02 | 8 | 2003 | Singapore | |
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Hitachi | S-9260A | CD-SEM | 1130-02 | 8 | | Singapore | |
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Hitachi | S-9360 | CD-SEM | 0106-04 | 8, 12 | 2012 | Singapore | |
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Hitachi | S-9380II | CD-SEM | | 8, 12 | 2009 | Singapore | |
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Hitachi | S-3400N | SEM | 340760-02 | | 2007 | Singapore | |
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Hitachi | S-4500 | SEM | 7910-5 | | 1993 | Singapore | |
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Hitachi | S-4800 | SEM with EDX | 9140-05 | | 2007 | Singapore | |
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Hitachi | S-5000 | SEM | 914-03 | | 1995 | Singapore | |
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Hitachi | S-5000H | SEM | 6936-02 | | 1998 | Singapore | |
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Hitachi | S-7840 | CD-SEM | 0008-02 | 8 | 2001 | Dresden | |
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FEI | Helios 400 | Dual Beam | D5031 | | | Singapore | |
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AMAT | Semivision CX200 | - | W-853 | | | Singapore | |
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Ultrafab | WetBench QD72 | 2 tank Wet Bench | 15135-06 | 6 | 1995 | Dresden | |
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TEGAL | Tegal 901 (Poly) | Etch | 10764 | 6 | | Dresden | |
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Tegal | OEM981 | Etch | | 8 | | Dresden | |
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Comet | (7) R20 Transfer Station | | HATS10 | 6, 8 | | Dresden | |
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Comet | Comet 2 Station wafer Transfer System | | 10AA0602 | | | Dresden | |
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Philips | XRF 2800 | | 943002800001 | 8 | 2000 | Dresden | |
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Prometrix | FT750-01 | | 9209 | | | Dresden | |
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RECIF | ANF8 | Notch Aligner | | 8 | | Dresden | |
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RECIF | BPP200A01 | Transfer Station | | | | Dresden | |
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TEL | Ofen Tel Minibatch | Formula Nitride | P00000315001 | 12 | 2004 | Dresden | |
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TEL | Ofen Tel Minibatch | Formula Oxide | P00000315002 | 12 | 2004 | Dresden | |
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TEL | UW200Z | Batch Wafer Processing | R031085 | 8 | 2003 | USA | |
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Applied Materials (AMAT) | eMax CT plus | eMax CT+ Dielectric etch chamber | 25596-07
| 12 | 2007 | Austria | |
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Applied Materials (AMAT) | eMax CT plus | eMax CT+ Dielectric etch chamber | 30999-13
| 12 | 2007 | Austria | |
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Applied Materials (AMAT) | eMax CT | eMax CT Dielectric etch chamber | 04403-10 | 12 | 2003 | Austria | |
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Applied Materials (AMAT) | Axiom HT plus | Axiom HT+ strip chamber | 08595-16 | 12 | 2007 | Austria | |
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Applied Materials (AMAT) | Enabler | Enabler Dielectric etch chamber | 11596-11 | 12 | 2007 | Austria | |
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Applied Materials (AMAT) | Enabler | Enabler Dielectric etch chamber | 29196-08 | 12 | 2007 | Austria | |
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Leica | Microskope | | 166495 | 8 | 1995 | Austria | |
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Leica | Microscope INS 10 | Microscope | 80135 | 6 | 1999 | Dresden | |
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Laserjet | LDS200A | LDS3 | 0047 | 6 | 2006 | Austria | |
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Laserjet LDS 200A | LDS200A | LDS1 | 0029 | 6 | 2006 | Austria | |
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Matech | WaveEtch 456-G2 | | G2/2-1107A | 6, 8 | 2007/11 | Austria | |
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KLA Tencor | P11 Surface Profiler | | 04970190 | | | Dresden | |
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IPEC/Westech | Avanti 472 | Wafer Polisher | 472-261 | 6 | | Dresden | |
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TePLA | 300 AL PC | Plasma/Etch | 1414 | 6 | 2000 | Dresden | |
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TePLA | 300 AL PC | Plasma/Etch | 1390 | 6 | 2000 | Dresden | |
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TePLA | 300 AL PC | Plasma/Etch | 1402 | 6 | 2000 | Dresden | |
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TePLA | 300 AL PC | Plasma/Etch | 1394 | 6 | 2000 | Dresden | |
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PVA TePLA | 300 AL PC | Photoresist stripping, Surface cleaning… | 1479 | 6 | 2004 | Dresden | |
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PVA TePLA | 300 AL PC | Photoresist stripping, Surface cleaning… | 1480 | 6 | 2004 | Dresden | |
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Linn High Therm | KH-64-S | Coating oven | FX039092 | | 2009 | Dresden | |
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Rigaku Europa GmbH | XRF 3630 | Wafer Analyzer | RR42036 | 8 | 1995 | Austria | |
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Veeco | Dektek 8 | Metrology | 23089 | | | Dresden | |
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